ZI Exhibits at the NC-AFM Conference 2009

Zurich Instruments participates at the NC-AFM Conference, August 11-13th, 2009

Zurich Instruments announces that it is going to present its HF2 lock-in amplifier and its HF2 programmable lock-in amplifier at the NC-AFM 2009 (non-contact atomic-force microscopy) conference taking place from the 11th to the 13th of August in Yale, Connecticut. The NC-AFM is a leading conference in the surface analysis community, and attracts many equipment manufacturers.

Zurich Instruments extends the scope of the exhibition with its lock-in products with unmatched operating frequency range, measurement precision, and multi-frequency operation. With multi-frequency, it is possible to measure and control a signal of interest at several frequencies simultaneously. This enables faster and more precise AFM operation. Your AFM application. Measured.

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